As coaches and talent management consultants we have used many different leadership development models when working with our clients. We have found that the most effective way to leadership and professional development is to have a clear method to development and improvement while also having as much control of the development and learning be in the hands of the individual. As a result, our work has culminated in The SID Way Workbook Series for Leaders and Managers with the belief that individuals want and need to have a way to be in charge and responsible for their professional success and their professional growth.
Ben and Sidney McDonald are co-founders of BenchMark Learning International. Both are respected executive coaches and facilitators of leadership programs. Their primary work has been with Fortune 500 corporations and some of the country’s leading universities including Dartmouth College, Johns Hopkins Medical University, Illinois Institute of Technology, and Case Western Reserve University.
Corporate clients have included Cisco Systems, CB&I, KBR, Skanska USA, Ericsson, Siemens and others. They specialize in the design, development, and delivery of leadership programs and are also experienced leadership development consultants and work with organizations in improving their leadership and talent management systems.
Both have held leadership positions in their professional career and have translated this experience into their leadership development programs and executive coaching. Until the founding of BenchMark Learning in 1999, Ben held leadership positions with GTE, McDonnell Douglas, and International Learning Systems. Prior to founding Benchmark Learning, Sidney was a leader at US West for over 17 years in sales, management, and training and development.
If you have any questions for your coaches on the content of our books, the SID process, or would like ideas to help you or your group exceed expectations in leadership development, you may contact us at questions@thesidway.com or complete the form below.
